2. General descripon
2.1 Over
view
The iXM series of dry pumps are low energy systems. The range sets new standards for
medium duty process, capability and reliability, with pumps designed to give low cost of
ownership. The variants are designed for Etch and Plasma-Enhanced Chemical Vapor
Deposion (PECVD) processes. The pumps are available in four capacity classes:
▪ 200 m
3
/hr
▪ 600 m
3
/hr
▪ 1200 m
3
/hr
▪ 3000 m
3
/hr
The pump
s ar
e compable for 200 ‑ 230 V or 380 ‑ 460 V supply.
Figure 1 Front view of system
1. Front panel control 2. Levelling feet (4 o)
3. Cas
tors (4 o) 4. Seismic bracket (4 o if installed)
5. Extracon port 6. RF Earth (ground) cable
7. Pumped gas inlet connecon 8. Liing eyebolt
1. Front panel control 2. Levelling feet (4 o)
3. Castors (4 o) 4. Seismic bracket (4 o if installed)
5. Extracon port 6. RF Earth (ground) cable
7. Pumped gas inlet connecon 8. Liing eyebolt
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Page 10M56635880_D
M56635880_D - General descripon