149
Setting a Wipe
Wipe patterns and modifiers are configured using the
menu.
This section describes the M/E-1 menu as an example.
Setting a Wipe Pattern
Selecting a wipe pattern
1
Open the Home > M/E-1 > Bus/Transition > Wipe >
Main Pattern menu (11109.31).
2
Press the button for a wipe pattern group.
Standard: S
tandard wipes
Enhanced: En
hanced wipes
Rotary: Ro
tary wipes
Masaic1 to Mosaic3: Mos
aic wipes
Random/Dust: R
andom/diamond dust wipes
The patterns in the selected group are displayed.
3
Set the button for the target wipe pattern to the on
state.
Adjusting wipe pattern parameters
When the following patterns are selected, set the
parameters.
Enhanced wipe pattern number 49 (polygon
wi
pe)
a) A value of –100.00 completely replaces the corner with a rounded arc,
and a value of +100.00 the corners are in the most pointed state.
Mosaic wipe pattern numbers 200 to 203, 206 to
213, 224 to 247, 250 to 257, 260 to 269
Mosaic wipe pattern numbers 220 to 223
(k
araoke wipe)
a) At –100.00, tiles appear from the top edge or left edge of the screen; at
+100.00, tiles appear from the bottom edge or right edge of the screen.
b) At –100.00, tiles in all rows appear simultaneously; at +100.00, tiles
ap
pear in the next row after the tiles in the previous row are completely
displayed.
Random wipe pattern number 273
Diamond dust wipe pattern number 274
Setting a Pattern Mix
Pattern mix
You can create a new pattern by mixing two patterns
(main and sub).
The following four types of pattern mix are available.
In an independent key transition, a pattern mix cannot be
used.
No. Parameter Adjustment
1 No. Number of corners
2 Star Rate Sharpness of the corner
a)
No. Parameter Adjustment
1 H Tile No. Number of tiles horizontally
2 V Tile No. Number of tiles vertically
No. Parameter Adjustment
1 Start Start position of tiles
a)
2 Row No. Number of rows of tiles
3 Phase Phase step to next row
b)
No. Parameter Adjustment
1 H Size Tile width
2 V Size Tile height
3 Volatility Rate of tile generation
No. Parameter Adjustment
1 H Size Particle width
2 V Size Particle height
3 Flash Rate Rate of generation of particles
Note
Pattern mix Description
Mix The effect of the sub pattern is added to
th
e main pattern, modifying the outline or
nature of the main pattern.
Positive NAM
(+ NAM)
Creates a pattern with an outline
co
mprising the sub pattern
superimposed on the main pattern.
Negative NAM
(– NAM)
Creates a pattern with an outline
c
omprising the overlap of the sub pattern
and main pattern.
Morphing As a transition progresses, the pattern
c
hanges. It morphs from the main
pattern, through a mix of main and sub,
to the sub pattern.
To Next Page
Loading...
Need help?
General
